Published Date: June 2024
ArF Dry and Immersion Resist Materials are photosensitive polymers used in a process called dry lithography. ArF immersion resist materials are also photosensitive polymers but are specifically formulated for immersion lithography. Immersion lithography utilizes a liquid medium, typically purified water, between the resist layer and the lens of the lithography system, enabling the use of shorter wavelengths of light. Dry lithography utilizes an ArF excimer laser with a wavelength of 193 nm to expose and pattern the resist material.
The rapid growth of ArF dry and immersion resist materials is driven by the increasing demand for high-resolution patterning, advancements in lithography technology, industry collaboration, cost-effective manufacturing, supportive infrastructure, and market competitiveness. As the semiconductor industry continues to push the boundaries of device miniaturization, the demand for these advanced resist materials is expected to grow further.
The report “ArF Dry and Immersion Resist Materials Market, By Type (ArF Dry and ArF Immersion), By Application (Semiconductors & Integrated Circuits and Printed Circuit Boards), and By Region (North America, Europe, Asia Pacific, Latin America, and Middle East & Africa) - Trends, Analysis and Forecast till 2034”
Key Highlights:
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In May 2023, Nikon Corporation launched the NSR-S625E, which an ArF immersion scanner optimized especially for middle critical layers. The NSR-S625E will aid in the productive manufacturing of a variety of semiconductor devices because it has the highest productivity in Nikon's lithography history due to its improved throughput and operational reliability.
Analyst View:
The semiconductor industry continues to attract significant investments from both private and public sectors. Investments in research and development, manufacturing infrastructure, and advanced lithography equipment will support the growth of the ArF dry and immersion resist materials market. Funding initiatives aimed at advancing semiconductor technologies will drive innovation and market expansion. Collaborative efforts facilitate the exchange of knowledge, sharing of resources, and joint development of new materials and technologies. Partnerships will play a crucial role in accelerating the adoption of advanced resist materials and driving ArF Dry and Immersion Resist Materials Market growth.
Browse 60 market data tables* and 35 figures* through 140 slides and in-depth TOC on “ArF Dry and Immersion Resist Materials Market, By Type (ArF Dry and ArF Immersion), By Application (Semiconductors & Integrated Circuits and Printed Circuit Boards), and By Region (North America, Europe, Asia Pacific, Latin America, and Middle East & Africa) - Trends, Analysis and Forecast till 2034”
Key Market Insights from the report:
ArF Dry and Immersion Resist Materials Market is segmented based on Type, Application and Region.
- Based on Type, ArF Dry and Immersion Resist Materials Market is segmented into Biopharmaceutical and Chemistry Medicine.
- Based on Application, ArF Dry and Immersion Resist Materials Market is segmented into Hospital and Clinic.
- By Region, the ArF Dry and Immersion Resist Materials Market is segmented into North America, Europe, Asia Pacific, Latin America, Middle East & Africa.
Competitive Landscape & their strategies of ArF Dry and Immersion Resist Materials Market:
The prominent players operating in the ArF Dry and Immersion Resist Materials Market includes, Pfizer, Inc., Roche, Inc., Sanofi, Inc., Johnson & Johnson, Merck & Co. (MSD), Novartis AG, AbbVie, Inc., Gilead Sciences, GlaxoSmithKline (GSK), Amgen and others.
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